Optical microlithography XIX : 21-24 February 2006, San Jose, California, USA :: ISBN 0819461970 :: International Society for Optical Engineering 2006 :: OBNB, the Open British National Bibliography

Publication Data

Title Optical microlithography XIX : 21-24 February 2006, San Jose, California, USA
Contributors Donis G. Flagello, Society of Photo-optical Instrumentation Engineers, SEMATECH
Publisher International Society for Optical Engineering
Publication date 2006
Publication location Bellingham, Wash.
Volumes 3
Language English

Descriptive Notes

Conference proceedings.

Topics

Microlithography :: Congresses
Integrated circuits :: Masks :: Congresses
X-ray lithography :: Congresses
Manufacturing processes :: Congresses

Catalogue Data

OBNB ID GBA6A3346
ISBN 10 0819461970
ISBN 13 n/a
Type BibliographicResource, MultiVolumeBook
Dewey Classification 621.381531

ISBD

P1053 3 v.
P1042 Includes bibliographical references and index.

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Optical microlithography XIX : 21-24 February 2006, San Jose, California, USA. ISBN 0819461970. Published by International Society for Optical Engineering in 2006. Publication and catalogue information, links to buy online and reader comments.