Photomask and next-generation lithography mask technology XIII : 18-20 April, 2006, Yokohama, Japan :: ISBN 0819463582 :: SPIE 2006 :: OBNB, the Open British National Bibliography

Publication Data

Title Photomask and next-generation lithography mask technology XIII : 18-20 April, 2006, Yokohama, Japan
Contributors Morihisa Hōga, Society of Photo-optical Instrumentation Engineers
Publisher SPIE
Publication date 2006
Publication location Bellingham, Wash.
Volumes 2
Language English

Descriptive Notes

Conference proceedings.
Some earlier proceedings have title: Photomask and X-ray mask technology.

Topics

Masks (Electronics) :: Congresses
Integrated circuits :: Masks :: Congresses
X-ray lithography :: Congresses
Microlithography :: Congresses
Optoelectronic devices :: Design and construction :: Congresses

Catalogue Data

OBNB ID GBA6A5080
ISBN 10 0819463582
ISBN 13 n/a
Type BibliographicResource, MultiVolumeBook
Dewey Classification 621.381531

ISBD

P1053 2 v.
P1042 Includes bibliographical references and index.

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Photomask and next-generation lithography mask technology XIII : 18-20 April, 2006, Yokohama, Japan. ISBN 0819463582. Published by SPIE in 2006. Publication and catalogue information, links to buy online and reader comments.