Low and ultralow dielectric constant films prepared by plasma-enhanced chemical vapor deposition / A. Grill
Spin-on dielectric materials / Geraud Dubois, Robert D. Miller, Willi Volksen
Positron annihilation spectroscopy / David W. Gidley, Hua-Gen Peng, Richard Vallery
Structure characterization of nanoporous interlevel dielectric thin films with x-ray and neutron radiation / Christopher L. Soles ... [et al.]
Ellipsometric porosimetry / Mikhail R. Baklanov
Mechanical and transport properties of low-k dielectrics / J. L. Plawsky ... [et al.]
Integration of low-k dielectric films in damascene processes / R. J. O. M. Hoofman ... [et al.]
ONO structures and oxynitrides in modern microelectronics : material science, characterization and application / Yakov Roizin, Vladimir Gritsenko
Material engineering of high-k gate dielectrics / Akira Toriumi, Koji Kita
Physical characterization of ultra-thin high-k dielectric / T. Conard, H. Bender, W. Vandervorst
Electrical characterization of advanced gate dielectrics / Robin Degraeve ... [et al.]
Integration issues of high-k gate dielectrics / Yasuo Nara
Anisotropic conductive film (ACF) for advanced microelectronic interconnects / Yi Li, C. P. Wong.
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Dielectric films for advanced microelectronics. ISBN 9780470013601. Published by John Wiley in 2007. Publication and catalogue information, links to buy online and reader comments.
