Advanced etch technology for nanopatterning IV :: ISBN 9781628415308 :: SPIE 2015 :: OBNB, the Open British National Bibliography

Publication Data

Title Advanced etch technology for nanopatterning IV
Contributors Qinghuang Lin, Sebastian U. Englemann, SPIE
Publisher SPIE
Publication date 2015
Publication location Bellingham, Washington
Language English

Topics

Plasma etching :: Congresses
Lithography :: Congresses

Catalogue Data

OBNB ID GBB542251
ISBN 10 1628415304
ISBN 13 9781628415308
Type BibliographicResource, Book
Dewey Classification 621.044

ISBD

P1053 1 volume (various pagings)
P1042 Includes bibliographical references.

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Advanced etch technology for nanopatterning IV. ISBN 9781628415308. Published by SPIE in 2015. Publication and catalogue information, links to buy online and reader comments.